Substrate thinning equipment
Precision Polishing Machine Introduction:
1. GNAD61 Precision Grinding polishing machine, host and all spare parts are high anti-corrosion materials, machine anti-corrosion, applicable to silicon and other semiconductor materials chemical machinery grinding and polishing. The equipment can be machined sample size range is 4 inches below.
2. The GNAD61 equipment has a workstation that can process a 4-inch sample and a number of different shapes and sizes less than 4 inches. The device fixture has a 100%-range swing function. This function design can ensure that the equipment in the grinding process, the realization of the full swing of the sample polishing, greatly improved the equipment polishing capacity and efficiency, but also avoid the excessive polishing time caused by the phenomenon of the collapse of the sample.
3. GNAD61 equipment mainframe equipped with vacuum system and automatic packing system and other related components. Vacuum systems, including vacuum pumps, filtration systems and related components. The vacuum system absorbs the sample directly at the bottom of the sample fixing device by means of vacuum pumping. According to the different process requirements, vacuum system can directly adsorb samples or directly adsorbed the glass substrate with samples. GNAD61 equipment with the host standard glass substrate using high-quality float glass, after sophisticated grinding technology to achieve the basic high flatness, TTV ≤ 2um. The filtration device carried by the vacuum system can effectively filter the waste liquid produced during the grinding process, so as to avoid the malfunction caused by inhaling the vacuum pump. Device Model: OCTY302
Origin: British brand: Crystapol
Device Model: GNAD61
Delivery Date: 4 months
Price: 2 million
中國辦事處聯(lián)系人：劉經(jīng)理
聯(lián)系電話：18901246266
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